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Plasma Etch #3 - Trion Minilock II


Contact: VINSE Cleanroom
ESB 111 - Cleanroom

Fee Structure

Get Access - Vanderbilt
Get Access - Non-Vanderbilt

The Trion Minilock is a load-locked reactive ion etch tool for dry etching of metal films and compound semiconductors using chlorine etch chemistry.


  • Process gases: Cl2, O2, N2, CF4, Ar
  • RIE generator: 600 W @ 13.56 MHz
  • Substrate size: Up to 200 mm diameter (8 inch)