Plasma Etch #3 - Trion Minilock II

Overview

Contact: VINSE Cleanroom
ESB 111 - Cleanroom
615-343-1468

Fee Structure

Get Access - Vanderbilt
Get Access - Non-Vanderbilt

The Trion Minilock is a load-locked reactive ion etch tool for dry etching of metal films and compound semiconductors using chlorine etch chemistry.

Capabilities

• Process gases: Cl₂, O₂, N₂, CF₄, Ar
• RIE generator: 600 W @ 13.56 MHz
• Substrate size: Up to 200 mm diameter (8 inch)