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VINSE - Vanderbilt Institute of Nanoscale Science and Engineering

VINSE - Vanderbilt Institute of Nanoscale Science and Engineering
  2. Facilities
  3. Instruments
  4. Mask Aligner - Karl Suss MA6

Mask Aligner - Karl Suss MA6

Overview

Contact: VINSE Cleanroom
ESB 111 - Cleanroom
615-343-1468

Fee Structure

Get Access - Vanderbilt
Get Access - Non-Vanderbilt

The Karl Suss MA-6 mask aligner is used for high resolution photolithography.  The mask aligner can perform precise alignment of plastic and hard chrome glass masks, both available for fabrication within the VINSE Cleanroom.  Microscope top side alignment and video back side alignment are available for multi-layer photolithography fabrication.  

Capabilities

  • X and Y shift <0.1 um
  • Various sample contact types 
    • Vacuum contact <0.8μm
    • Hard contact <1.5μm
    • Soft contact <2.5μm
    • Proximity <3.0μm
  • Programmable proximity exposure gap of 10-300 µm in 1 µm steps
  • Programmable alignment gap of 1 - 999 µm in 1 µm steps
  • Video Back side alignment to 1 um
  • Top side alignment to 0.5 um
  • Microscope magnification: 5x, 10x, and 20x
  • Sample holder: 3 inch wafer, 4 inch wafer, piece (down to 5 x 5 mm)
    • Samples up to 6 mm thick
  • Light source:
    • 350 W Hg-Arc lamp
    • Suss UV400 Optics (350 - 450 nm)
  • Mask size: 
    • Hard masks - 5 x 5 inch chrome glass masks
    • Plastic masks - must fit onto a 5 x 5 inch glass mask