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Laser Writer - Heidelberg Instruments uPG101

Overview

Contact: VINSE Cleanroom
ESB 111 - Cleanroom
615-343-1468

Fee Structure

Get Access - Vanderbilt
Get Access - Non-Vanderbilt

The Heidelberg Instruments μPG 101 laser writer is a versatile micro pattern generation tool for direct writing/maskless lithography and low volume mask making of chrome-glass photolithography masks.  The tool is compatible with a wide range of sample sizes, sample materials, and photoresists.  The chrome-glass masks are compatible with the VINSE Karl Suss MA-6 mask aligner.  All masks are printed by VINSE Cleanroom Staff unless otherwise specified.

Capabilities 

  • Minimum feature size:
    • Line in space: 2 μm
    • Space between lines: 2 μm
    • Line array: 2 μm
    • Point in space: 4 μm
  • Sample size: 1 cm x 1 cm to 13 cm x 13 cm
  • Sample types: recipes developed for silicon and glass, discuss other sample material with VINSE cleanroom staff
  • Pattern size: 10 μm x 10 μm to 10 cm x 10 cm
  • Pattern write time dependent on pattern size and photoresist used
  • Chrome glass masks
    • Mask size: 5 inch x 5 inch, mask blanks supplied by VINSE
    • Dark field and bright field masks available
    • Printed by VINSE Cleanroom Staff
  • Supported photoresists:
    • AZ 1518
    • Shipley S1805
    • Shipley 1813
    • NR9 1000PY
    • mr-DWL-40
    • SPR 220 4.5
    • SPR 220 7.0
  • Automated and manual focusing options
  • Focal depth: 6 μm
  • Automated edge detection, structure detection, and manual alignment for multilayer patterns
  • Input file types: gds, dxf, bmp, cif, or gbr
  • Light source: 405 nm laser (class 1 in tool enclosure)