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VINSE - Vanderbilt Institute of Nanoscale Science and Engineering

VINSE - Vanderbilt Institute of Nanoscale Science and Engineering
  2. Facilities
  3. Instruments
  4. Angstrom Amod Multimode Deposition System

Angstrom Amod Multimode Deposition System

Overview

Contact: VINSE Cleanroom
ESB 111 - Cleanroom
615-343-1468

Fee Structure

Get Access - Vanderbilt
Get Access - Non-Vanderbilt

The Angstrom Amod Multimode system is a versatile tool for physical vapor deposition (PVD) of thin films of insulators, semiconductors, and metals via electron beam evaporation, resistive thermal evaporation, or RF sputtering.   Multiple source materials can be loaded into the 6-pocket, indexed e-beam hearth or 2-position resistive thermal section.   RF sputtering is available from a single gun in sputter-up configuration, with additional gases available for reactive sputtering.  The deposition chamber can be opened to air or to a nitrogen glovebox with a spincoater, allowing coatings of air-sensitive samples such as organic films.

Capabilities

  • Current deposition materials:
    • Electron beam evaporation: Fe, Ti, SiO2, Al2O3, Ag, Ni, Au, Pt, Si, Pd
    • Resistive thermal evaporation: Al, Cr
    • RF sputtering: Ti, VO2 (V target), Al2O3
    • Additional materials available upon request
  • Maximum sample size:
    • Flat holder: 5 inch (14 cm) diameter
    • Angled holder: 3 inch x 2 inch (8.4 cm x 5 cm)
  • Sample holders:
    • Flat and angled (improved liftoff and fidelity of sub-micron features) sample holders available
    • Holder rotation for high uniformity films available
    • Holder Z translation: 9 inch (10 cm)
    • Temperature range: liquid nitrogen-cooled to 800 oC
  • Deposition hardware:
    • 2 resistive thermal evaporation sources
    • 1 sputter gun in sputter-up configuration (sample sits at top of chamber)
    • Ar and O2 gases available for sputtering
    • 6 pocket electron beam evaporation hearth with programmable beam sweep controller and crucible indexer
  • Film thickness controlled by quartz crystal microbalance in conjunction with manual or PID loop control
  • Chamber reaches 5e-6 Torr after a 30 minute pumpdown
  • Direct access to nitrogen glovebox with spincoater and to resistive deposition system for air-sensitive samples

Applications

  • Metal Electrodes
  • Active Materials (VO2)
  • Metamaterials
  • Nanoparticles and Nanoparticle Coatings