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VINSE - Vanderbilt Institute of Nanoscale Science and Engineering

VINSE - Vanderbilt Institute of Nanoscale Science and Engineering
  2. Facilities
  3. Instruments
  4. Rapid Thermal Processor (RPT) SSI Solaris 150

Rapid Thermal Processor (RPT) SSI Solaris 150

Overview

Contact: VINSE Cleanroom
ESB 111 - Cleanroom
615-343-1468

Fee Structure

Get Access - Vanderbilt
Get Access - Non-Vanderbilt

The Solaris 150 Rapid Thermal Processor (Surface Science Integration, Inc.) is a manual loading RTP system for R&D and pre-production.  The unique temperature measurement system of the Solaris 150 requires virtually no calibration for different wafer types and backside emissivity differences.  The Solaris 150 uses a unique PID process controller that ensures accurate temperature stability and uniformity. 

Capabilities

  • Total dimensions: 21.5” x 23” x 10.5”
  • Wafer handling: manual load, single wafer processing
  • Wafer sizes: 2”, 3”, 4”, and 6” wafers
    • 4” wafer carrier available for smaller pieces
  • Temperature: room temperature - 1300°C
    • Thermocouple accuracy: + 2.5°C
    • Temperature uniformity: +5°C across 6” wafer at 1150°C
    • Temperature repeatability: + 3°C or better at 1150°C