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Reactive Ion Etch Chlorine

Trion Minilock II RIE

Overview

RIE Photo
Optical grating etched into Si using the Trion Minilock II reactive ion etcher. Fabricated in the VINSE cleanroom. (Owen Meilander, VINSE Superuser)

The Trion Minilock is a load-locked reactive ion etch tool for dry etching of metal films and compound semiconductors using chlorine etch chemistry.

Capabilities

RIE Photo
  • Process gases:
    • Cl2, O2, N2, CF4, Ar
    • BCl3 - Upon request
  • RF generator: 600 W @ 13.56 MHz
  • Substrate size: Up to 8 inch (200 mm) diameter
See All User Fees

Contact

  • VINSE Cleanroom

    VINSE Cleanroom

    Dr. Ben Schmidt, Manager

    Dr. Christina McGahan
    Megan Dernberger

    • 111 Engineering Science Building

Get Access

Vanderbilt User Access
External User Access