VINSE offers customized photolithography patterning for direct-write or photomask applications. Tanner [Siemens] L-Edit IC software is a CAD package capable of complex, multi-layer layout editing for cleanroom tools such as the Bungard photoplotter, Heidelberg uPG101 laser writer, Raith eLine electron beam lithography system [EBL], and the future Elionix ELS-BODEN 50 EBL. Currently, VINSE provides licensed versions of L-Edit for student use at multiple workstations throughout the cleanroom and adjacent facilities, though those licenses are set to expire at the end of July 2026.
Several layout programs are available, and VINSE staff recommends KLayout, a free, open-source software package used by many academic institutions for micro- and nanofabrication and compatible with the tools listed above. It is similar to L-Edit and other CAD software; it is expected to have a gentle learning curve. VINSE staff are preparing user tutorials and can provide guidance or complete design assistance. Please contact vinse-cleanroom@vanderbilt.edu or visit the technical staff office hours on Tuesdays, ESB 226, 9 AM – 12 PM with questions.