VINSE is pleased to announce that the Ion Wave 10 Batch Plasma System has been successfully repaired and returned to service in the VINSE cleanroom.
The Ion Wave 10 is a microwave plasma processing system that delivers higher ion and radical densities at lower substrate bias voltages than traditional RF plasma tools. This enables faster photoresist ashing and SU-8 removal while minimizing plasma-induced damage to sensitive materials and device structures.
The system supports a range of fabrication and analysis processes, including photoresist descum, surface cleaning and activation, passivation layer etching, and device decapsulation. Its compact footprint, recipe-based process control, and Windows-based touch-screen interface make it both powerful and accessible to users across experience levels.
With the Ion Wave 10 back online, VINSE users regain access to a low-damage, high-throughput plasma tool that supports research, teaching, and shared cleanroom workflows across the Vanderbilt community