Rapid Thermal Processor (RPT) SSI Solaris 150
Overview
Contact: VINSE Cleanroom
ESB 111 - Cleanroom
615-343-1468
Fee Structure
Get Access - Vanderbilt
Get Access - Non-Vanderbilt
The Solaris 150 Rapid Thermal Processor (Surface Science Integration, Inc.) is a manual loading RTP system for R&D and pre-production. The unique temperature measurement system of the Solaris 150 requires virtually no calibration for different wafer types and backside emissivity differences. The Solaris 150 uses a unique PID process controller that ensures accurate temperature stability and uniformity.
Capabilities
- Total dimensions: 21.5” x 23” x 10.5”
- Wafer handling: manual load, single wafer processing
- Wafer sizes: 2”, 3”, 4”, and 6” wafers
- 4” wafer carrier available for smaller pieces
- Temperature: room temperature - 1300°C
- Thermocouple accuracy: + 2.5°C
- Temperature uniformity: +5°C across 6” wafer at 1150°C
- Temperature repeatability: + 3°C or better at 1150°C