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PECVD

Trion Orion II

Description:

Plasma enhanced chemical vapor deposition reactor for depositing silicon-based films, such as SiO2, SiNx, and a-Si.

Process gases include:
  • 10% SiH4 in He
  • 1% PH3 in He
  • 2% B(CH3)3 in H2
  • NH3
  • N2O
  • O2
  • Ar
  • H2
  • N2
  • CF4