Plasma Etch #3
Trion Minilock II
Description:
Chlorine based chemistry for reactive ion etching:
- Aluminum
- Aluminum oxide
- Silicon
- Any material requiring chlorine chemistry
Process gases include Cl2, BCI3, CF4, O2, N2
Chlorine based chemistry for reactive ion etching:
Process gases include Cl2, BCI3, CF4, O2, N2