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Dual Beam FIB-SEM: Helios

Helios Nanolab G3 CX


Three dimensional nano-patterning of surfaces via the removal of material using the direct interaction of a computer controlled Ga ion beam with a solid surfaces. The Helios FIB-SEM provides the capability to fabricate TEM thin sections, modify surfaces using electron and ion beam induced deposition, and is an excellent imaging platform using either the ion or electron beam columns.