The Nikon LV100 optical microscope offers 2.5, 10, 20, 50, and 100x magnification. Integrated image capture software provides many options for processing.
Trion Orion II (Learn more)
Plasma enhanced chemical vapor deposition reactor for depositing:
- Silicon dioxide
- Silicon nitride
- Amorphous silicon
Process gases include 10% SiH4 + He, NH3, N2O, O2, N2, and Ar
Trion Minilock II (Learn more)
Chlorine based chemistry for reactive ion etching:
- Aluminum oxide
- Any material requiring chlorine chemistry
Process gases include Cl2, BCI3, CF4, O2, N2
Trion Phantom II (Learn more)
Fluorine based chemistry for reactive ion etching:
- Any materials requiring fluorine chemistry
Process gases include CF4, CHF3, SF6, O2
The Solaris 150 (Surface Science Integration, Inc.) is a manual loading RTP system for R&D and pre-production. The Solaris 150 can process up to 152.4mm (6") substrates at a temperature range from RT - 1300 0C. The unique temperature measurement system of the Solaris requires virtually no calibration for different wafer types and backside emissivity differences. The Solaris uses a unique PID process controller that ensures accurate temperature stability and uniformity.
The ATC 2200 (AJA International, Inc.) is a versatile load-locked sputter coating system. There are 4 available sputter guns which can be configured for either DC or RF magnetron sputtering. Samples may also be heated to 800 0C and rotated for increased uniformity. Current sputter targets are Si (undoped), SiO2, and Si3N4. Available gases are Ar, O2, and N2.