Click to return to the VINSE homepage
REU
Facilities:

Nano-Optics Laboratory
Lab Director: Professor Richard F. Haglund, Jr. (615) 343-7263
Lab Contact: Dr. Anthony B. Hmelo a.hmelo@vanderbilt.edu or (615) 343-7212, 5616 Stevenson Center

A laboratory for the fabrication and characterization of nano-patterned surfaces, films, and devices employing optical and ion beam methods.

Instruments

AFM - Atomic Force MicroscopeFIB - Focused Ion Beam MicroscopeLaser writer
AFM - Atomic Force MicroscopeFIB - Focused Ion Beam MicroscopePhoto not available

The Digital Instruments Nanoscan III AFM performs high resolution imaging of nanostructured devices by mapping the interaction of a sharp probe scanned across surface features at near atomic resolution.


Three dimensional sculpting of nano-structured surfaces via the removal of material using the direct interaction of a computer controlled Ga ion beam with solid surfaces. Learn more here.


Heidelberg Instruments uPG 101 micro pattern generator


Optical Mask AlignerPLD - Pulsed Laser Deposition SystemSpin Bake Unit
Optical Mask AlignerPLD - Pulsed Laser Deposition SystemSpin Bake Unit

The Karl Suss MA6 with video backside alignment is currently configured for 4 in wafer and 5 in mask.


Manufactured by PVD Products, the EPION 3000 is a versatile tool for thin film and nanocyrstal growth. The target material is ablated with a laser; the plume deposits material on a substrate. Learn more here.


The Brewer Science Cee 200CB is a combination spin-bake tool for coating and curing of photoresist.  Spinner features:  chucks for large and small samples, manual photoresist dispensing, 6000 rpm max. spin speed.  Bake plate feature: 300C max. temperature


VINSE Buddies Management  
Photo not available  

This calendar will be used to manage VINSE Buddy shift assignments


  
 
Vanderbilt University